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As an important sputtering target, niobium target has high purity, good ductility, chemical stability, high melting point and boiling point, high conductivity, electrical insulation performance, etc. These characteristics make it widely used in many high-tech fields.
Product Specifications：
| Name | Niobium Sputtering Target |
| Refer to | HTST16 |
| Purity | 99.9% |
| Size | Diameter 1-6 inches * thickness 0.125-0.25 inches * length 12-20 inches, customizable |
Preparation process: powder metallurgy, vacuum melting, vacuum casting, sintering, etc.
Packing method: carton + pearl cotton (can be packed according to customer requirements)
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Application Areas:
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Spherical niobium powder is prepared by RF plasma spheronization technology, which has the characteristics of high purity and low oxygen, high sphericity, smooth surface, no satellites, uniform particle size distribution, excellent flowability, high bulk density and high vibration density.
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