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Tantalum sputtering target

Tantalum Sputtering Target

Tantalum Sputtering Target

Tantalum target is a target material made of metallic tantalum, which is widely used in various industrial fields, especially in high-tech fields such as electronics, semiconductors and medical equipment manufacturing.

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Product Specifications:

Name Tantalum Sputtering Target
Price 800yuan/KG
Purity 99.5%-99.99%
Size Diameter 50mm*thickness 3mm, customizable

 

Preparation process: powder metallurgy, vacuum melting, vacuum casting, sintering, etc.

Packing method: carton + pearl cotton (can be packed according to customer requirements)

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Application Areas:

  • Aerospace: Tantalum targets are used to manufacture high-performance alloys in the aerospace and defense industries to improve the strength and high temperature resistance of the material.
  • Medical devices: Tantalum targets are used to manufacture surgical instruments and implants in the body, such as bone fixation devices and pacemaker components, due to its biocompatibility.
  • Chemical and petroleum industries: Tantalum targets are used for corrosion-resistant coatings on equipment to extend the service life of the equipment.
  • Semiconductor manufacturing: Tantalum targets are used to manufacture thin-film resistors, and their high stability and corrosion resistance enable them to maintain good performance in extreme environments. Tantalum capacitors are widely used in electronic devices due to their high capacitance and low leakage current characteristics.

          

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