
Tantalum target is a target material made of metallic tantalum, which is widely used in various industrial fields, especially in high-tech fields such as electronics, semiconductors and medical equipment manufacturing.
Product Specifications:
Name | Tantalum Sputtering Target |
Price | 800yuan/KG |
Purity | 99.5%-99.99% |
Size | Diameter 50mm*thickness 3mm, customizable |
Preparation process: powder metallurgy, vacuum melting, vacuum casting, sintering, etc.
Packing method: carton + pearl cotton (can be packed according to customer requirements)
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Application Areas:
Spherical tantalum powder is prepared by RF plasma spheronization technology, featuring high purity, low oxygen content, high sphericity, smooth surface, no satellites, uniform particle size distribution, excellent flow properties, high bulk density and high vibration density.
Read MoreSpherical tantalum powder is prepared by RF plasma spheronization technology, featuring high purity, low oxygen content, high sphericity, smooth surface, no satellites, uniform particle size distribution, excellent flow properties, high bulk density and high vibration density.
Read MoreSpherical tantalum powder is prepared by RF plasma spheronization technology, featuring high purity, low oxygen content, high sphericity, smooth surface, no satellites, uniform particle size distribution, excellent flow properties, high bulk density and high vibration density.
Read MoreSpherical tantalum powder is prepared by RF plasma spheronization technology, featuring high purity, low oxygen content, high sphericity, smooth surface, no satellites, uniform particle size distribution, excellent flow properties, high bulk density and high vibration density.
Read MoreSpherical tantalum powder is prepared by RF plasma spheronization technology, featuring high purity, low oxygen content, high sphericity, smooth surface, no satellites, uniform particle size distribution, excellent flow properties, high bulk density and high vibration density.
Read MoreSpherical tantalum powder is prepared by RF plasma spheronization technology, featuring high purity, low oxygen content, high sphericity, smooth surface, no satellites, uniform particle size distribution, excellent flow properties, high bulk density and high vibration density.
Read MoreMetallurgical tantalum powder is a silver-grey powder with a metallic luster. It is mainly composed of high-purity tantalum elements and has the characteristics of high melting point, strong corrosion resistance, large specific capacitance, and good ductility. It is a key basic material for the production of tantalum capacitors, tantalum alloy products and other electronic components and high-end alloy materials. It plays an important role in many fields such as electronics, aerospace, and chemical industry.
Read MoreMetallurgical tantalum powder is a silver-grey powder with a metallic luster. It is mainly composed of high-purity tantalum elements and has the characteristics of high melting point, strong corrosion resistance, large specific capacitance, and good ductility. It is a key basic material for the production of tantalum capacitors, tantalum alloy products and other electronic components and high-end alloy materials. It plays an important role in many fields such as electronics, aerospace, and chemical industry.
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